Process Development for the Fabrication of Semiconductor Devices and Circuits Using Spin-On Dopant
نویسندگان
چکیده
....................................................................................................................................................... iii List of Tables ............................................................................................................................................... vi List of Figures ............................................................................................................................................. vii Chapter 1: Introduction ................................................................................................................................. 1 Section 1.1: Semiconductor Prototyping: ................................................................................................. 1 Section 1.2: Photolithography Masks: ...................................................................................................... 3 Section 1.3: Education: ............................................................................................................................. 3 Chapter 2: Background ................................................................................................................................. 6 Chapter 3: Experimental Design ................................................................................................................. 12 Section 3.1: Proof of Concept Experiment ............................................................................................. 12 Section 3.2: Mask Design and Fabrication ............................................................................................. 15 Section 3.3: Contact Comparison............................................................................................................ 19 Section 3.4: Diffusion Profile Variation ................................................................................................. 23 Section 3.5: Process Variation ................................................................................................................ 24 Chapter 4: Results and Analysis ................................................................................................................. 27 Section 4.1: Proof of Concept Analysis .................................................................................................. 27 Section 4.2: Contact Comparison............................................................................................................ 31 Section 4.3: Diffusion Profile Variation ................................................................................................. 34 Section 4.4: Process Variation ................................................................................................................ 38 Chapter 5: Conclusion ................................................................................................................................. 44
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